Induction Time for Nucleation in Amorphous Silicon Films Prepared by Plasma CVD
Suzuki, Masakuni, Hiramoto, Masahiro, Oguiura, Mitsugu, Kamisaka, Wataru, Hasegawa, SeiichiVolume:
27
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.27.L1380
Date:
August, 1988
File:
PDF, 482 KB
english, 1988