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Alkali-Developable Silicone-Based Negative Photoresist (SNP) for Deep UV, Electron Beam, and X-Ray Lithographies
Ban, Hiroshi, Tanaka, Akinobu, Kawai, Yoshio, Deguchi, KimiyoshiVolume:
28
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.28.L1863
Date:
October, 1989
File:
PDF, 183 KB
english, 1989