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Application of MoO 3 Electron Resist to Lift-Off Process
Okamoto, Masaaki, Baba, Mamoru, Ikeda, ToshioVolume:
29
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L518
Date:
March, 1990
File:
PDF, 369 KB
english, 1990