Nanolithography Using a Chemically Amplified Negative...

Japanese Journal of Applied Physics 1994 / 12 Vol. 33; Iss. Part 1, No

Nanolithography Using a Chemically Amplified Negative Resist by Electron Beam Exposure

Manako, Shoko, Ochiai, Yukinori, Fujita, Jun-ichi, Samoto, Norihiko, Matsui, Shinji
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Volume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.6993
Date:
December, 1994
File:
PDF, 899 KB
1994
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