Intermetal Dielectric Gap Fill by Plasma Enhanced Chemical Vapor Deposited Fluorine-Doped Silicon Dioxide Films
Yoo, Woo Sik, Swope, RichardVolume:
35
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.L273
Date:
March, 1996
File:
PDF, 1.00 MB
1996