Post-Exposure-Bake Simulation Model with Constant Acid Loss of Chemically Amplified Resist
Yanagishita, Yuichiro, Miyata, Shuichi, Kaimoto, Yuko, Oikawa, Akira, Yano, Ei, Hanyu, IsamuVolume:
36
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.7611
Date:
December, 1997
File:
PDF, 427 KB
english, 1997