Bilayer SiN X...

Japanese Journal of Applied Physics 1999 / 11 Vol. 38; Iss. Part 1, No

Bilayer SiN X /Diamond Films for X-Ray Lithography Mask

Huang, Bohr-Ran, Sheu, Jeng-Tzong, Wu, Chia-Haur
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Volume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.38.6530
Date:
November, 1999
File:
PDF, 699 KB
english, 1999
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