Effects of Thermal History on Residual Order of Thermally...

Japanese Journal of Applied Physics 2003 / 12 Vol. 42; Iss. Part 1, No

Effects of Thermal History on Residual Order of Thermally Grown Silicon Dioxide

Tatsumura, Kosuke, Watanabe, Takanobu, Yamasaki, Daisuke, Shimura, Takayoshi, Umeno, Masataka, Ohdomari, Iwao
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Volume:
42
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.7250
Date:
December, 2003
File:
PDF, 399 KB
2003
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