Depth Profiling of Si Oxidation States in Si-Implanted SiO...

Japanese Journal of Applied Physics 2003 / 11 Vol. 42; Iss. Part 2, No

Depth Profiling of Si Oxidation States in Si-Implanted SiO 2 Films by X-Ray Photoelectron Spectroscopy

Liu, Yang, Fu, Yong Qing, Chen, Tu Pei, Tse, Man Siu, Fung, Steve, Hsieh, Jang-Hsing, Yang, Xiao Hong
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Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.L1394
Date:
November, 2003
File:
PDF, 125 KB
english, 2003
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