![](/img/cover-not-exists.png)
In situ Observation of Clusters in Gas Phase during 4H-SiC Epitaxial Growth by Chemical Vapor Deposition Method
Ishida, Yuuki, Takahashi, Tetsuo, Okumura, Hajime, Arai, Kazuo, Yoshida, SadafumiVolume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.5140
Date:
August, 2004
File:
PDF, 1.26 MB
english, 2004