Incubation-Free Growth of Polycrystalline Si Films by Plasma-Enhanced Chemical Vapor Deposition Using Pulsed Discharge under Near Atmospheric Pressure
Kitabatake, Hirotatsu, Suemitsu, Maki, Kitahata, Hiroya, Nakajima, Setsuo, Uehara, Tsuyoshi, Toyoshima, YasutakeVolume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.L683
Date:
May, 2005
File:
PDF, 390 KB
english, 2005