Quantitative Estimation of the Metal-Induced Negative Oxide...

Japanese Journal of Applied Physics 2006 / 3 Vol. 45; Iss. 3A

Quantitative Estimation of the Metal-Induced Negative Oxide Charge Density in n-Type Silicon Wafers from Measurements of Frequency-Dependent AC Surface Photovoltage

Shimizu, Hirofumi, Shin, Ryuhei, Ikeda, Masanori
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Volume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.1471
Date:
March, 2006
File:
PDF, 788 KB
english, 2006
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