Improving Electrical Characteristics of High- k NiTiO Dielectric with Nitrogen Ion Implantation
Yang, Wen-Luh, Chao, Tien-Sheng, Chen, Shine-China, Yang, Chin-Hao, Peng, Wu-ChinVolume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.6902
Date:
September, 2006
File:
PDF, 115 KB
english, 2006