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Upgrading design of the 3B1A beamline for x-ray nanometre lithography of microelectronic devices at BSRF
Fu-Ting, Yi, Tian-Chun, Ye, Liang-Qiang, Peng, Da-Peng, Chen, Ju-Fang, Zhang, Yong, HanVolume:
13
Language:
english
Journal:
Chinese Physics
DOI:
10.1088/1009-1963/13/5/027
Date:
May, 2004
File:
PDF, 237 KB
english, 2004