X-ray photoelectron spectroscopy damage characterization of...

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X-ray photoelectron spectroscopy damage characterization of reactively ion etched InP in CH[sub 4]–H[sub 2] plasmas

Y. Feurprier
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Year:
1998
Language:
english
DOI:
10.1116/1.590213
File:
PDF, 567 KB
english, 1998
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