Reaction between Aluminium and SiO 2...

Japanese Journal of Applied Physics 1976 / 10 Vol. 15; Iss. 10

Reaction between Aluminium and SiO 2 in Integrated Circuits

Cavanagh, E., Franco, J. I., Reca, N. E. Walsöe de
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Volume:
15
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.15.1877
Date:
October, 1976
File:
PDF, 220 KB
english, 1976
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