The Etch Resistance of Electron Beam Resists in Chemical...

Japanese Journal of Applied Physics 1978 / 7 Vol. 17; Iss. 7

The Etch Resistance of Electron Beam Resists in Chemical Dry Etching System Using Microwave Excitation

Jinno, Kiyokatsu
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Volume:
17
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.17.1283
Date:
July, 1978
File:
PDF, 864 KB
1978
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