Screening of Hot Electron Energy Relaxation in a Semiconductor by Shallow Impurities
Otsuka, Eizo, Ohyama, Tyuzi, Fujii, KenichiVolume:
20
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.20.L885
Date:
December, 1981
File:
PDF, 344 KB
english, 1981