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Thermal Analysis and Experimental Evaluation of Melting Threshold Energy of Si Thin Film Structure in Laser Annealing
Murakami, Koichi, Takahashi, Tetsuo, Koyanagi, Tadamasa, Hoh, Koichiro, Komiya, Yoshio, Tarui, YasuoVolume:
21
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.21.879
Date:
June, 1982
File:
PDF, 170 KB
english, 1982