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Decrease in Electrical Resistivity of W Films on GaAs Substrates after High-Temperature Annealing
Ohfuji, Shin-ichi, Kuriyama, Youichi, Nagano, JinVolume:
25
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.25.1865
Date:
December, 1986
File:
PDF, 482 KB
english, 1986