Hydrogen Concentration and Bond Configurations in Silicon...

Japanese Journal of Applied Physics 1988 / 1 Vol. 27; Iss. Part 1, No

Hydrogen Concentration and Bond Configurations in Silicon Nitride Films Prepared by ECR Plasma CVD Method

Hirao, Takashi, Setsune, Kentaro, Kitagawa, Masatoshi, Kamada, Takeshi, Wasa, Kiyotaka, Tsukamoto, Kazuyoshi, Izumi, Tomio
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Volume:
27
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.27.30
Date:
January, 1988
File:
PDF, 300 KB
english, 1988
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