Photochemical Vapor Deposition of Aluminum Thin Films Using...

Japanese Journal of Applied Physics 1988 / 8 Vol. 27; Iss. Part 2, No

Photochemical Vapor Deposition of Aluminum Thin Films Using Dimethylaluminum Hydride

Hanabusa, Mitsugu, Hayakawa, Kikuo, Oikawa, Akira, Maeda, Katsunori
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Volume:
27
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.27.L1392
Date:
August, 1988
File:
PDF, 317 KB
english, 1988
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