DC Bias Effects on Growth of a-Ge:H in Coaxial-Type ECR...

Japanese Journal of Applied Physics 1989 / 5 Vol. 28; Iss. Part 1, No

DC Bias Effects on Growth of a-Ge:H in Coaxial-Type ECR Plasma

Aoki, Takeshi, Kato, Seiichi, Hirose, Masataka, Nishikawa, Yasuo
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Volume:
28
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.28.849
Date:
May, 1989
File:
PDF, 235 KB
english, 1989
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