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Effect of Channel Implantation on the Device Performance of Low Temperature Processed Polycrystalline Silicon Thin Film Transistors
Ono, Kikuo, Oikawa, Saburou, Konishi, Nobutake, Miyata, KenjiVolume:
29
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.2705
Date:
December, 1990
File:
PDF, 165 KB
english, 1990