Effect of Reduction in Impurity Content for a-Si:H Films

Japanese Journal of Applied Physics 1990 / 10 Vol. 29; Iss. Part 2, No

Effect of Reduction in Impurity Content for a-Si:H Films

Morimoto, Akiharu, Matsumoto, Minoru, Kumeda, Minoru, Shimizu, Tatsuo
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Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L1747
Date:
October, 1990
File:
PDF, 561 KB
1990
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