Effect of Silicon Surface Cleaning on the Initial Stage of...

Japanese Journal of Applied Physics 1990 / 1 Vol. 29; Iss. Part 2, No

Effect of Silicon Surface Cleaning on the Initial Stage of Selective Titanium Silicide Chemical Vapor Deposition

Saito, Kunio, Amazawa, Takao, Arita, Yoshinobu
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Volume:
29
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L185
Date:
January, 1990
File:
PDF, 256 KB
english, 1990
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