Plasma Etching of ITO Thin Films Using a CH...

Japanese Journal of Applied Physics 1990 / 10 Vol. 29; Iss. Part 2, No

Plasma Etching of ITO Thin Films Using a CH 4 /H 2 Gas Mixture

Mohri, Mikio, Kakinuma, Hiroaki, Sakamoto, Masaaki, Sawai, Hideo
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Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L1932
Date:
October, 1990
File:
PDF, 721 KB
1990
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