Reduction of Textural Drift in a Laser Recrystallized...

Japanese Journal of Applied Physics 1990 / 6 Vol. 29; Iss. Part 2, No

Reduction of Textural Drift in a Laser Recrystallized Silicon-on-Insulator Structure Employing Liquid Encapsulation

Doi, Atsutoshi, Meguro, Takashi, Aoyagi, Yoshinobu
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Volume:
29
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L847
Date:
June, 1990
File:
PDF, 233 KB
english, 1990
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