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Submicron Particles Observed during Etching Process
Morita, Yoshimitsu, Yamaguchi, Masanori, Iida, Shinya, Nitami, KenjiVolume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.3140
Date:
July, 1993
File:
PDF, 237 KB
english, 1993