In Situ Infrared Study of Surface Oxide...

Japanese Journal of Applied Physics 1993 / 11 Vol. 32; Iss. Part 1, No

In Situ Infrared Study of Surface Oxide Formation on Gas-Evaporated Si Microcrystals

Hayashi, Shinji, Kawata, Satoshi, Kim, Han Min, Yamamoto, Keiichi
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Volume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.4870
Date:
November, 1993
File:
PDF, 409 KB
english, 1993
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