Temperature-Dependent Reaction of rf Hydrogen Plasma with...

Japanese Journal of Applied Physics 1994 / 8 Vol. 33; Iss. Part 2, No

Temperature-Dependent Reaction of rf Hydrogen Plasma with Silicon

Sun, Yong, Nishitani, Ryusuke, Miyasato, Tatsuro
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Volume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L1117
Date:
August, 1994
File:
PDF, 1.65 MB
1994
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