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Anisotropic Etching of n + -Polysilicon Using Beam Plasmas Generated by Gas Puff Plasma Sources
Oomori, Tatsuo, Taki, Masakazu, Nishikawa, Kazuyasu, Ootera, Hiroki, Ono, KouichiVolume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.2101
Date:
April, 1995
File:
PDF, 148 KB
english, 1995