In Situ Monitoring of Selective Copper Deposition Processes in a Metal-Organic Chemical Vapor Deposition Using Fourier-Transform Infrared Reflection-Absorption Spectroscopy
Hanaoka, Ken-ichi, Ohnishi, Hiroshi, KunihideTachibana,Volume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.2430
Date:
May, 1995
File:
PDF, 544 KB
english, 1995