In Situ Monitoring of Selective Copper Deposition Processes...

In Situ Monitoring of Selective Copper Deposition Processes in a Metal-Organic Chemical Vapor Deposition Using Fourier-Transform Infrared Reflection-Absorption Spectroscopy

Hanaoka, Ken-ichi, Ohnishi, Hiroshi, KunihideTachibana,
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Volume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.2430
Date:
May, 1995
File:
PDF, 544 KB
english, 1995
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