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Evaluation of Double Spacer Local Oxidation of Silicon (LOCOS) Isolation Process for Sub-Quarter Micron Design Rule
Jang, Se-Aug, Kim, Young-Bog, Cho, Byung-Jin, Kim, Jong-ChoulVolume:
36
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.1433
Date:
March, 1997
File:
PDF, 1.10 MB
1997