Numerical Simulation of Etching and Deposition Processes

Japanese Journal of Applied Physics 1997 / 7 Vol. 36; Iss. Part 1, No

Numerical Simulation of Etching and Deposition Processes

Hamaguchi, Satoshi, Mayo, Anita A., Rossnagel, Stephen M., Kotecki, David E., Milkove, Keith R., Wang, Cindy, Farrell, Curtis. E.
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Volume:
36
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.4762
Date:
July, 1997
File:
PDF, 301 KB
english, 1997
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