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Fabrication of PbZr x Ti 1- x O 3 Films on Si Structures Using Y 2 O 3 Buffer Layers
Park, Byung-Eun, Shouriki, Shigeto, Tokumitsu, Eisuke, Ishiwara, HiroshiVolume:
37
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.37.5145
Date:
September, 1998
File:
PDF, 161 KB
english, 1998