Paramagnetic Defects Related to Positive Charges in Silicon...

Japanese Journal of Applied Physics 2000 / 10 Vol. 39; Iss. Part 2, No

Paramagnetic Defects Related to Positive Charges in Silicon Oxynitride Films

Miura, Yoshinao, Fujieda, Shinji, Hasegawa, Eiji
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Volume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.39.L987
Date:
October, 2000
File:
PDF, 302 KB
english, 2000
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