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Reliability of Thin Gate Oxides Irradiated under X-Ray Lithography Conditions
Cho, Byung Jin, Kim, Sun Jung, Ang, Chew Hoe, Ling, Chung Ho, Joo, Moon Sig, Yeo, In SeokVolume:
40
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.40.2819
Date:
April, 2001
File:
PDF, 192 KB
english, 2001