Reliability of Thin Gate Oxides Irradiated under X-Ray...

Japanese Journal of Applied Physics 2001 / 4 Vol. 40; Iss. Part 1, No

Reliability of Thin Gate Oxides Irradiated under X-Ray Lithography Conditions

Cho, Byung Jin, Kim, Sun Jung, Ang, Chew Hoe, Ling, Chung Ho, Joo, Moon Sig, Yeo, In Seok
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
40
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.40.2819
Date:
April, 2001
File:
PDF, 192 KB
english, 2001
Conversion to is in progress
Conversion to is failed