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Influences of Point and Extended Defects on As Diffusion in Si
Kim, Ryangsu, Hirose, Tetsuya, Shano, Toshihumi, Tsuji, Hiroshi, Taniguchi, KenjiVolume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.41.227
Date:
January, 2002
File:
PDF, 482 KB
english, 2002