High-Power Compact Laser-Plasma Source for X-ray Lithography
Gaeta, Celestino J., Rieger, Harry, Turcu, I. C. Edmond, Forber, Richard A., Campeau, Serge M., Cassidy, Kelly L., Powers, Michael J., Maldonado, Juan R., French, Gary, Naungayan, Joseph, Kelsey, CharVolume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.41.4111
Date:
June, 2002
File:
PDF, 254 KB
english, 2002