Line Edge Roughness of Developed Resist with Low-Dose...

Japanese Journal of Applied Physics 2002 / 6 Vol. 41; Iss. Part 1, No

Line Edge Roughness of Developed Resist with Low-Dose Electron Beam Exposure

Kotera, Masatoshi, Yamada, Takeshi, Ishida, Yoshihisa
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Volume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.41.4150
Date:
June, 2002
File:
PDF, 377 KB
english, 2002
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