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Interface Reaction of a Silicon Substrate and Lanthanum Oxide Films Deposited by Metalorganic Chemical Vapor Deposition
Yamada, Hirotoshi, Shimizu, Takashi, Suzuki, EiichiVolume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.41.L368
Date:
April, 2002
File:
PDF, 142 KB
english, 2002