Structure and Properties of Silicon Thin Films Deposited at...

Japanese Journal of Applied Physics 2003 / 8 Vol. 42; Iss. Part 2, No

Structure and Properties of Silicon Thin Films Deposited at Low Substrate Temperatures

Fejfar, Antonín, Mates, Tomá\vs, Fojtík, Petr, Ledinský, Martin, Luterová, Kate\vrina, Stuchlíková, Ha, Pelant, Ivan, Ko\vcka, Jan, Baumruk, Vladimír, Macková, Anna, Ito, Manabu, Ro, Kazuyoshi, Uyama,
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Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.L987
Date:
August, 2003
File:
PDF, 660 KB
english, 2003
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