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Conductance Transient Comparative Analysis of Electron-Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposited SiN x , SiO 2 /SiN x and SiO x N y Dielectric Films on Silicon Substrates
Castán, Helena, Dueñas, Salvador, Barbolla, Juan, del Prado, 'Alvaro, San Andrés, Enrique, Mártil, Ignacio, González-Díaz, GermánVolume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.66
Date:
January, 2004
File:
PDF, 442 KB
english, 2004