Fully Silicided NiSi Gate Electrodes on HfSiON Gate...

Japanese Journal of Applied Physics 2005 / 4 Vol. 44; Iss. 4B

Fully Silicided NiSi Gate Electrodes on HfSiON Gate Dielectrics for Low-Power Applications

Manabe, Kenzo, Takahashi, Kensuke, Ikarashi, Taeko, Morioka, Ayuka, Watanabe, Heiji, Yoshihara, Takuya, Tatsumi, Toru
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.2205
Date:
April, 2005
File:
PDF, 124 KB
english, 2005
Conversion to is in progress
Conversion to is failed