Characteristics of Ultra Thin Hf-Silicate Gate Dielectrics...

Japanese Journal of Applied Physics 2005 / 4 Vol. 44; Iss. 4B

Characteristics of Ultra Thin Hf-Silicate Gate Dielectrics on Si 0.9954 C 0.0046 /Si Heterolayers

Liu, Kou-Chen, Maikap, Sidhu, Chen, Pang-Shiu
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.2447
Date:
April, 2005
File:
PDF, 281 KB
english, 2005
Conversion to is in progress
Conversion to is failed