In-Plane Orientation and Annealing Behavior of Rutile TiO...

Japanese Journal of Applied Physics 2005 / 5 Vol. 44; Iss. 5A

In-Plane Orientation and Annealing Behavior of Rutile TiO 2 Films on MgO Substrate Prepared by Inductively Coupled Plasma-Assisted Sputtering

Okimura, Kunio, Furumi, Takahiro
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.3192
Date:
May, 2005
File:
PDF, 278 KB
english, 2005
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