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Simulations of Mask Error Enhancement Factor in 193 nm Immersion Lithography
Yeh, Kwei-tin, Loong, Wen-anVolume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.2481
Date:
April, 2006
File:
PDF, 267 KB
english, 2006