Defect Reduction in Polycrystalline Silicon Thin Films by...

Japanese Journal of Applied Physics 2007 / 3 Vol. 46; Iss. 3B

Defect Reduction in Polycrystalline Silicon Thin Films by Heat Treatment with High-Pressure H 2 O Vapor

Sameshima, Toshiyuki, Hayasaka, Hiromi, Maki, Masato, Masuda, Atsushi, Matsui, Takuya, Kondo, Michio
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Volume:
46
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.46.1286
Date:
March, 2007
File:
PDF, 650 KB
english, 2007
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