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Optimized Silicidation Technique for Source and Drain of Fin-Type Field-Effect Transistor
Okuyama, Kiyoshi, Sugimura, Atsushi, Sunami, HideoVolume:
47
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.47.2407
Date:
April, 2008
File:
PDF, 629 KB
english, 2008